Oil-free 2L-400C diode sputter-ion pump for clean high and ultra-high vacuum systems. Stated nitrogen pumping speed: 450 L/s; ultimate pressure: ≤1 × 10⁻⁸ Pa. The source configuration includes a bakeout jacket and high-voltage power supply. Confirm the complete specification and scope of supply before ordering.
Description
2L-400C Diode Sputter-Ion Pump
The 2L-400C is intended for clean high and ultra-high vacuum systems that require oil-free operation and no pump-generated mechanical vibration. A Penning discharge ionizes residual gas; titanium sputtered from the cathodes provides an active surface for pumping reactive gases.
Typical applications include large vacuum chambers, ion sources, coating systems and test stands. Pump-down and commissioning normally require a suitable backing and high-vacuum stage before the ion pump is started.
| Nitrogen pumping speed | 450 L/s |
|---|---|
| Argon pumping speed stated in source record | Approximately 45 L/s |
| Ultimate pressure | ≤1 × 10−8 Pa |
| Maximum start pressure | ≤5 × 10−4 Pa |
| Inlet flange | CF150 |
| Maximum bakeout temperature | <200 °C with magnets / <300 °C without magnets |
| Bakeout jacket | Included in the source configuration |
| High-voltage power supply | Included in the source configuration |
| Indicative dimensions | Approximately 500 × 265 × 600 mm |
| Indicative weight | Approximately 153 kg |
Actual system pressure depends on gas load, conductance, cleanliness, bakeout, instrumentation and the backing arrangement. For heavy and inert gases, use the operating and regeneration procedures stated by the manufacturer. Confirm the current datasheet, polarity, cable, controller, magnets, bakeout hardware and flange before ordering.
LeakLab can provide integration, leak testing, high-voltage setup and commissioning documentation subject to an agreed project scope.
